Plasma Immersion Ion Implantation Simulation
This project associated with the Sonderforschungsbereich
438, subproject A3.
Project team:
Project Rationale
The plasma immersion ion implantation process is of potentially great significance
for the modification of surfaces, since in principle it permits the implantation
of ions into a surface without the usual line-of-sight restrictions of
ion-beam techniques. In this project we are developing a numerical simulation
that helps to better understand and model the ion implantation process.
Our approach consists of a coupled finite element simulation for the
electric potential and a particle method to trace representative paths
of ion from the plasma into the material.
The project is a cooperation of the
Project results/ reports /papers
-
Stals, Paulus, Rüde, Rauschenbach: Numerical
Modelling of the Plasma Source Ion Implantation Process in 2D (report,
preliminary, 1084 KB gzipped, ps file)
-
Stals, Paulus, Rüde, Rauschenbach: Numerical
Modelling of the Plasma Source Ion Implantation Process in 2D, to be
published in the proceedings of CTAC97 (Adelaide, 1997), World Scientific,
short version of the above. (243 KB, gzipped, ps file)
-
Michael Paulus: Modellierung
und Simulation der Prozesse bei der Plasma-Immersions-Ionenimplantation
, Diplomarbeit, Dezember 1997. (960KB gzipped postscript).
Ulrich
Rüde , 21.1.98, 27.1.98